Desktop masklesslithography.

The NANYTE BEAM is a desktop (benchtop) maskless lithography system — a UV direct-write tool that patterns wafers and substrates directly from a digital layout, with no photomask. It reaches sub-0.4 µm resolution across a full 8-inch (200 mm) wafer, in a footprint that sits on a lab bench.

BEAM reaches a minimum feature size of 0.4 µm and a guaranteed 0.5 µm pitch, held edge to edge across a full 8-inch (200 mm) wafer — with 0.5 µm through-the-lens overlay and 0.1 µm bidirectional stage repeatability. To help you reach optimal linewidths, NANYTE also supplies process guidelines for common photoresists.

BEAM's Advanced engine exposes in 16-bit grayscale — 65,536 dose levels — so it can write smooth 3D and variable-depth structures such as micro-optics, blazed gratings, microlens arrays, and grayscale reliefs in a single exposure, rather than stacking binary layers.

BEAM's Advanced optics engine is optimized for 405 nm (h-line), with 365 nm (i-line) software-selectable. 405 nm gives the best transmission through the optics and works with most thin positive photoresists — for example Microposit S1805, AZ 5214E, and AZ ECI 3007. 365 nm covers i-line-sensitive resists that respond weakly or not at all at 405 nm, such as AZ nLOF lift-off resists and the SU-8 family — so one tool spans both with no hardware change.

BEAM is used across photonics, MEMS, microfluidics, micro-optics, metamaterials, grayscale lithography, rapid prototyping, and general research patterning — anywhere mask sets are too slow or too expensive. It is in use at 40+ universities, fabs, and R&D labs worldwide.

BEAM can expose one writefield in under 0.1 s, depending on the resist's dose requirements — a very high power-density UV LED delivers the intensity to clear most resists in a single short flash. Overall throughput then depends on the objective: from about 3 mm² per minute at 50× (0.5 µm pitch) up to 500 mm² per minute at 2.5×, letting you trade resolution for write speed on each job.

BEAM is priced very competitively — few systems, if any, reach 0.4 µm at this price point. Every BEAM is still quoted individually, so there is no fixed list price: cost depends on the stage (BEAM, XL, or XL8) and the optics engine (Lite, Standard, or Advanced) you choose. Request a quote and NANYTE responds within 1–2 business days.

Yes. NANYTE (Nanyte Pte. Ltd., Singapore) designs and manufactures BEAM and is the OEM. The same system is sold through distribution partners under their own branding — including as POLOS® BEAM through Semiconductor Production Systems (SPS) and via SIMTRUM — so 'POLOS BEAM' and Simtrum's BEAM are the identical NANYTE-built tool, with the same specifications. It is sometimes searched as a direct-write or 'laser writer' system; BEAM is a UV-LED/DMD maskless tool. For demos and the full datasheet, contact NANYTE directly at info@nanyte.com.

Email info@nanyte.com or use the enquiry form on this page. Depending on your location, NANYTE can arrange an online demo or a live, in-person one, and will share the full specification datasheet on request. Expect a reply within 1–2 business days.